Product Overview
MaskStudio is a fracturing system that converts your layout data to mask writing machine data.
Today’s huge layout data can be efficiently converted thanks to the sophisticated parallel distributed processing system, which has been proven by running conversion over 200 parallel processes. The product also features the trapezoid fracturing technology to minimize unwanted small figures and rich boolean operation functions to optimize data to your mask writing machine. These features will guarantee you to minimize mask writing cost and TAT.
Support Format
The following platforms are supported.
Input
Format | Version |
---|---|
GDSII | Version 5/ 6/ 7 |
OASIS | 1.0 |
JEOL52 | V1.0/ V1.1/ V2.1/ V3.0/ V3.1/ JOB |
MEBES(*1) | RETICLE/ MODE5/JOB |
Toshiba/NuFlare Tech. | VSB11/ VSB12/ JOB |
USER | USER-Format |
(*1) MEBES file cannot be converted to a file other than MEBES.
Output
Format | Version |
---|---|
GDSII | Version 6/ 7 |
OASIS | 1.0 |
OASIS.MASK | 2.0 |
JEOL52 | V1.0/ V2.1/ V3.0/ V3.1/ JOB |
MEBES | RETICLE/ MODE5 / JOB |
Toshiba/NuFlare Tech. | VSB11/ VSB12/ JOB |
Image file (*2) | BMP/ JPEG/ TIFF/ PBM |
(*2) Outputting image files may need the external command "convert" (ImageMagick) dependng on the format.
Operating Environment
OS | Version | Architecture |
---|---|---|
Linux | RedHat Enterprise Linux 7, 8, 9 | x86_64 |