Product Overview

MaskStudio is a fracturing system that converts your layout data to mask writing machine data.
Today’s huge layout data can be efficiently converted thanks to the sophisticated parallel distributed processing system, which has been proven by running conversion over 200 parallel processes. The product also features the trapezoid fracturing technology to minimize unwanted small figures and rich boolean operation functions to optimize data to your mask writing machine. These features will guarantee you to minimize mask writing cost and TAT.

Support Format

The following platforms are supported.

Input

(*1) MEBES file cannot be converted to a file other than MEBES.

Output

(*2) Outputting image files may need the external command "convert" (ImageMagick) dependng on the format.

Operating Environment