MaskStudio

Product Overview

MaskStudio is a fracturing system that converts your layout data to mask writing machine data.
Today’s huge layout data can be efficiently converted thanks to the sophisticated parallel distributed processing system, which has been proven by running conversion over 200 parallel processes. The product also features the trapezoid fracturing technology to minimize unwanted small figures and rich boolean operation functions to optimize data to your mask writing machine. These features will guarantee you to minimize mask writing cost and TAT.

Support Format

The following platforms are supported.

Input

Format Version
GDSII Version 5/ 6/ 7
OASIS 1.0
JEOL52 V1.0/ V1.1/ V2.1/ V3.0/ V3.1/ JOB
MEBES(*1) RETICLE/ MODE5/JOB
Toshiba/NuFlare Tech. VSB11/ VSB12/ JOB
USER USER-Format

(*1) MEBES file cannot be converted to a file other than MEBES.

Output

Format Version
GDSII Version 6/ 7
OASIS 1.0
OASIS.MASK 2.0
JEOL52 V1.0/ V2.1/ V3.0/ V3.1/ JOB
MEBES RETICLE/ MODE5 / JOB
Toshiba/NuFlare Tech. VSB11/ VSB12/ JOB
Image file (*2) BMP/ JPEG/ TIFF/ PBM

(*2) Outputting image files may need the external command "convert" (ImageMagick) dependng on the format.

Operating Environment

OS Version Architecture
Linux RedHat Enterprise Linux 7, 8, 9 x86_64